Seoul, South Korea

Jung Soo Lee

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2019-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung Soo Lee. Retrieved from https://idiyas.com/inventor/jung-soo-lee-bn9d22e0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Jung Soo Lee: Display Technology Inventor

Introduction

Jung Soo Lee is an inventor based in Seoul, South Korea. His listed work includes two patents focused on display devices and their manufacturing methods. He works at Samsung Display Co., Ltd.

Latest Patents

Lee’s latest listed patents share the title “Display Device and Manufacturing Method Thereof.” The described invention features a substrate supporting a semiconductor layer, insulating layers, and conductive layers connected through contact holes. The first and second contact holes overlap, while a residual portion of the second insulating layer remains within the first contact hole. The patent description presents this layered arrangement as part of a display device and its manufacturing method.

Career Highlights

Lee’s patent portfolio includes 2 patents, with the listed inventions addressing display-device structure and fabrication. His work is associated with Samsung Display Co., Ltd., a company focused on display technologies.

Collaborations

Lee’s listed coworkers include Gwang Min Cha and Jun Hong Park. Their names are provided as professional collaborators, though specific joint contributions are not detailed in the supplied information.

Conclusion

Jung Soo Lee’s listed patent work centers on display-device construction and manufacturing, including layered components and overlapping contact holes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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