Ulsan, South Korea

Jung-Soo Chang

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Sdi Co., Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung-Soo Chang. Retrieved from https://idiyas.com/inventor/jung-soo-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Jung-Soo Chang: Innovator in Cathode Ray Tube Technology

Introduction

Jung-Soo Chang is a notable inventor based in Ulsan, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative work on cathode ray tubes.

Latest Patents

Chang holds a patent for a "Shadow mask for cathode ray tube." This invention features a shadow mask designed for a cathode ray tube that includes a faceplate panel with an inner phosphor screen. The front surface of the mask is equipped with a beam-guide portion that has multiple apertures, surrounded by a non-opening portion. The side wall of the mask is bent at an angle from the non-opening portion and is fixed to the panel via a mask frame. Notably, the front surface of the shadow mask incorporates a predetermined waved pattern in at least one direction. He has 1 patent to his name.

Career Highlights

Jung-Soo Chang is currently employed at Samsung SDI Co., Inc., where he continues to push the boundaries of display technology. His work has been instrumental in enhancing the performance and efficiency of cathode ray tubes.

Collaborations

Chang has collaborated with notable colleagues, including Kwang-sik Lee and Dong-Hwan Kim, contributing to various projects that advance technology in their field.

Conclusion

Jung-Soo Chang's innovative contributions to cathode ray tube technology exemplify his expertise and dedication to advancing display technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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