This inventor holds 1 USPTO granted patent. Top assignee: Korea Research Institute of Chemical Technology. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Jung-Mok Suh: Innovator in Antislipping Agent Technology
Introduction
Jung-Mok Suh is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of chemical technology, particularly in the development of antislipping agents. His innovative approach has led to advancements that enhance the performance and efficiency of these materials.
Latest Patents
Jung-Mok Suh holds a patent for a "Process for manufacturing an acrylic antislipping agent composed of small amounts of solid content." This invention focuses on creating a highly efficient antislipping agent derived from acrylic latexes. The process involves using two different acrylic latexes, one flexible with a low glass transition temperature and the other hard with a relatively high glass transition temperature. By blending these latexes through neutralization with aqueous ammonia, the physical properties such as homogeneity, tackiness, flexibility, and hardness can be effectively controlled.
Career Highlights
Jung-Mok Suh is affiliated with the Korea Research Institute of Chemical Technology, where he continues to push the boundaries of chemical innovation. His work has not only contributed to the field but has also paved the way for further research and development in antislipping technologies.
Collaborations
He has collaborated with esteemed colleagues, including In-Hwan Park and Ja-Soon Jang, to enhance the research and application of his inventions. Their combined expertise has fostered a productive environment for innovation.
Conclusion
Jung-Mok Suh's contributions to the development of antislipping agents exemplify the impact of innovative thinking in chemical technology. His patent reflects a significant advancement in the field, showcasing the potential for improved materials in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
