Taipei, Taiwan

Jung-Li Yen

This inventor holds 1 USPTO granted patent. Top assignee: Arima Computer Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung-Li Yen. Retrieved from https://idiyas.com/inventor/jung-li-yen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Jung-Li Yen: Innovator in Liquid Crystal Panel Technology

Introduction

Jung-Li Yen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of liquid crystal technology, particularly in the fabrication of liquid crystal panels. His innovative methods have the potential to enhance the performance and reliability of these essential components in various electronic devices.

Latest Patents

Jung-Li Yen holds a patent for a method titled "Method for fabricating an LC panel having m×n panel patterns and 2m+2n seal patterns." This patent describes a technique for fabricating a liquid crystal (LC) panel that limits the distance λ between each of the small panel patterns and each of the gasket seal patterns to 0 < μ < 0.25 mm. This innovation aims to eliminate deformation on the periphery of large LC panels, which can occur when small LC panels are segmented from larger ones.

Career Highlights

Jung-Li Yen is currently associated with Arima Computer Corporation, where he applies his expertise in liquid crystal technology. His work at the company has been instrumental in advancing the development of high-quality LC panels, which are crucial for modern display technologies.

Collaborations

Due to space constraints, the collaborations section has been omitted.

Conclusion

Jung-Li Yen's contributions to liquid crystal technology through his innovative patent demonstrate his commitment to improving electronic display systems. His work continues to influence the industry and pave the way for future advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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