Hwaseong, South Korea

Jung Joon Pyeon

This inventor holds 1 USPTO granted patent. Top assignees: Csk Corporation, Samsung Electronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung Joon Pyeon. Retrieved from https://idiyas.com/inventor/jung-joon-pyeon-535yilv2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jung Joon Pyeon: Innovator in Semiconductor Fabrication

Introduction

Jung Joon Pyeon is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative patent related to atomic layer deposition processes.

Latest Patents

Jung Joon Pyeon holds a patent for a scrubber and an ALD process system that includes the scrubber. The patent describes a method for fabricating a semiconductor device, which involves providing a wafer inside a process chamber. The process includes performing an ALD (atomic layer deposition) process to deposit titanium nitride on the wafer. The method further details the use of a scrubber to filter and adsorb powders from the process gas, ensuring a cleaner and more efficient fabrication process.

Career Highlights

Throughout his career, Jung Joon Pyeon has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Co., Ltd. and CSK Corporation, where he has contributed to advancements in semiconductor technologies.

Collaborations

Jung Joon Pyeon has collaborated with talented individuals in his field, including Seo Young Maeng and Il Jun Jeon. These collaborations have likely enhanced his innovative capabilities and contributed to his success as an inventor.

Conclusion

Jung Joon Pyeon's work in semiconductor fabrication exemplifies the impact of innovation in technology. His patent for the scrubber and ALD process system showcases his commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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