Jung-Hwan Um

Title: Jung-Hwan Um: Innovator in Substrate-Processing Technology

Introduction

Jung-Hwan Um is a notable inventor based in Seongnam, South Korea. He has made significant contributions to the field of substrate-processing technology, holding a total of 2 patents. His work focuses on improving the efficiency and reliability of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is titled "Diagnosing an abnormal state of a substrate-processing apparatus." This method involves measuring the temperature of a chuck within the substrate-processing apparatus. The temperature is then compared to a target temperature using a temperature-controlling unit. By analyzing a control signal transmitted from the temperature-controlling unit to a drive parameter-applying unit, an abnormal state of the substrate-processing apparatus can be diagnosed.

Another significant patent is for a "Dielectric window, plasma processing system including the window, and method of fabricating semiconductor device using the system." This invention describes a plasma process apparatus that features a process chamber defined by an outer wall and a dielectric window. The dielectric window is designed with a first dielectric material and includes a coil antenna configured to receive RF power, enhancing the efficiency of semiconductor device fabrication.

Career Highlights

Jung-Hwan Um is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to contribute to cutting-edge technologies in semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers such as Sung-moon Park and Sang-yoon Soh, further enhancing the innovative capabilities of his team.

Conclusion

Jung-Hwan Um's contributions to substrate-processing technology and his innovative patents reflect his expertise and commitment to advancing semiconductor manufacturing. His work continues to influence the industry positively.