Seoul, South Korea

Jung Hee Won

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Lg Household & Health Care Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung Hee Won. Retrieved from https://idiyas.com/inventor/jung-hee-won-d68er2p3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Jung Hee Won

Introduction

Jung Hee Won is an accomplished inventor based in Seoul, South Korea. He has made significant contributions to the field of innovation, particularly with his work on a unique mask. His dedication to advancing technology is evident through his patent, which showcases his inventive spirit.

Latest Patents

Jung Hee Won holds a patent for a mask, which reflects his commitment to improving health and safety products. This innovation is particularly relevant in today's world, where personal protective equipment has become essential.

Career Highlights

Jung Hee Won is associated with LG Household & Health Care Ltd., a leading company in the consumer goods sector. His role at the company allows him to leverage his skills and creativity to develop products that enhance everyday life.

Collaborations

Jung Hee Won has collaborated with talented coworkers, including Keum Ok Kim and Ji Ung Park. Their teamwork exemplifies the collaborative spirit that drives innovation within their organization.

Conclusion

Jung Hee Won's contributions to the field of invention, particularly with his patented mask, highlight his role as a forward-thinking inventor. His work at LG Household & Health Care Ltd. and collaborations with colleagues further emphasize the importance of teamwork in driving innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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