Kanagawa, Japan

Jun Zhang

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 24(Granted Patents)


Location History:

  • Tokyo, JP (2006 - 2008)
  • Kanagawa, JP (2008 - 2018)

Company Filing History:


Years Active: 2006-2025

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Jun Zhang

Introduction

Jun Zhang is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of liquid discharge technology, holding a total of 7 patents. His work has been instrumental in advancing the capabilities of various devices used in this domain.

Latest Patents

Among his latest patents are several innovative designs, including a liquid discharge head, a liquid discharge device, and a method of manufacturing a liquid discharge head. The liquid discharge head features a nozzle plate, a housing, a channel, and a positioning member. This design allows for efficient liquid flow through the channel to the nozzle hole, ensuring precise positioning of the nozzle plate relative to the housing. Additionally, he has developed a polishing sheet that includes a surface with convex portions, each equipped with abrasive grains of varying hardness, enhancing the polishing process.

Career Highlights

Jun Zhang is currently employed at Ricoh Company, Ltd., where he continues to push the boundaries of innovation in liquid discharge technology. His work has not only contributed to the company's product offerings but has also set new standards in the industry.

Collaborations

Throughout his career, Jun Zhang has collaborated with notable colleagues, including Kiyotaka Sawada and Hiroyuki Endoh. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Jun Zhang's contributions to the field of liquid discharge technology exemplify the spirit of innovation. His patents and collaborative efforts continue to influence the industry, showcasing the importance of creativity and teamwork in technological advancement.

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