Jun Young Cho

Title: Innovations of Jun Young Cho in Substrate Treatment Technology

Introduction

Jun Young Cho is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Jun Young Cho holds 1 patent for his invention titled "Support unit, and apparatus for treating substrate with the same." This patent describes a substrate treating apparatus that includes a housing, treating space, and a support unit designed to support a substrate. The apparatus features a dielectric plate, gas supply unit, and plasma source to generate plasma. It includes a top edge electrode and a bottom edge electrode, which work together to effectively treat substrates.

Career Highlights

Cho is currently employed at Psk Inc., where he continues to innovate and develop advanced technologies in substrate treatment. His work has been instrumental in improving the efficiency and effectiveness of substrate processing methods.

Collaborations

Throughout his career, Jun Young Cho has collaborated with talented individuals such as Jong Chan Lee and Ju Young Park. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jun Young Cho's contributions to substrate treatment technology exemplify the spirit of innovation. His patent and ongoing work at Psk Inc. highlight his commitment to advancing this field.