Jiangsu, China

Jun Ye

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Wuxi China Resources Huajing Microelectronics Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Ye. Retrieved from https://idiyas.com/inventor/jun-ye-q9wf47vz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Jun Ye - Innovator in Trench MOSFET Technology

Introduction

Jun Ye is a prominent inventor based in Jiangsu, China. He has made significant contributions to the field of microelectronics, particularly in the development of trench MOSFET technology. His innovative work has led to advancements that are crucial for modern electronic devices.

Latest Patents

Jun Ye holds a patent for a trench MOSFET and a method of manufacturing trench MOSFET. The patent describes a trench MOSFET that includes a substrate, an epitaxial layer, a plurality of trenches, and a body region. The substrate and epitaxial layer both have a first conductivity type, while the body region has a second conductivity type. This innovative design allows for improved performance in electronic applications.

Career Highlights

Jun Ye is currently employed at Wuxi China Resources Huajing Microelectronics Co., Ltd. His work at this company has positioned him as a key player in the microelectronics industry. He has demonstrated a strong commitment to advancing technology through his research and development efforts.

Collaborations

Jun Ye has collaborated with notable colleagues, including Xuan Xiao and Jie Li. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jun Ye's contributions to trench MOSFET technology exemplify his dedication to innovation in the field of microelectronics. His work continues to influence the development of advanced electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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