Niigata, Japan

Jun Yamamoto


 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Jun Yamamoto - Innovator in Silicon Wafer Manufacturing

Introduction

Jun Yamamoto is a notable inventor based in Niigata, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the production of epitaxial silicon wafers. His innovative methods have the potential to enhance the quality and efficiency of silicon wafer production.

Latest Patents

Yamamoto holds a patent for a "Method of manufacturing epitaxial silicon wafers." This method enables a reduction in carbon concentration in the epitaxial film. The process involves forming an epitaxial silicon wafer in a reaction chamber with a wafer-holding susceptor. This chamber separates the upper and lower spaces, which communicate through a predetermined gap. The method includes creating a flow of processing gas that moves laterally along the upper surface of the wafer while simultaneously establishing a flow of main purging gas directed upward in the lower space. The flow rate ratio of the main purging gas to the processing gas is set between 1.0/100 and 1.5/100, with the processing gas flow rate defined as 100. Additionally, the pressure in the upper space is controlled to remain within atmospheric pressure ±0.2 kPa.

Career Highlights

Yamamoto is currently employed at GlobalWafers Japan Co., Ltd., where he continues to develop and refine his innovative techniques in silicon wafer manufacturing. His work has positioned him as a key figure in the semiconductor industry, contributing to advancements that benefit various technological applications.

Collaborations

Yamamoto collaborates with Shinya Matsuda, a talented coworker who brings her expertise to their joint projects. Together, they work on enhancing the processes involved in silicon wafer production.

Conclusion

Jun Yamamoto's contributions to the field of semiconductor manufacturing, particularly through his patented method for producing epitaxial silicon wafers, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry positively.

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