Daegu, South Korea

Jun Wook Kim

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Wook Kim. Retrieved from https://idiyas.com/inventor/jun-wook-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Jun Wook Kim

Introduction

Jun Wook Kim is a notable inventor based in Daegu, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Jun Wook Kim holds a patent for an "Apparatus for treating substrate." This invention includes a liquid supply unit designed to deliver light-emission sources and/or a treating liquid onto the substrate. Additionally, it features a voltage application unit that applies voltage to the substrate after the light-emission sources have been supplied. This technology represents a significant advancement in substrate treatment methods.

Career Highlights

Jun Wook Kim is currently employed at Semes Co., Ltd., a company known for its innovative solutions in the semiconductor industry. His work at Semes has allowed him to focus on developing cutting-edge technologies that improve manufacturing processes.

Collaborations

He collaborates with talented coworkers, including Jae Hyun You and Sang Joon Lee. Their combined expertise contributes to the success of their projects and the advancement of technology in their field.

Conclusion

Jun Wook Kim's contributions to substrate treatment technology exemplify the spirit of innovation. His patent and work at Semes Co., Ltd. highlight his commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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