This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignees: Sumitomo Rubber Industries Limited, Tokyo Institute of Technology. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2023
Title: Innovations of Jun Sawada in Rotaxane and Polyurethane
Introduction
Jun Sawada is an accomplished inventor based in Tokyo, Japan. He is known for his significant contributions to the field of materials science, particularly in the development of novel compounds. His work has led to advancements in the use of rotaxanes and polyurethanes, showcasing his innovative approach to solving complex problems.
Latest Patents
One of Jun Sawada's notable patents is focused on a rotaxane and polyurethane using the same. The invention aims to provide a novel rotaxane that features a crown ether and a chain molecule piercing through the cyclic structure of the crown ether. This design includes a hydroxyl group at one terminal of the chain molecule, which bonds to the cyclic structure of the crown ether. Furthermore, the invention presents a polyurethane that utilizes the rotaxane as a polyol component. This patent highlights his creativity and technical expertise in material development.
Career Highlights
Throughout his career, Jun Sawada has worked with prestigious institutions, including the Tokyo Institute of Technology and Sumitomo Rubber Industries Limited. His experience in these organizations has allowed him to collaborate with other experts in the field and contribute to various research projects.
Collaborations
Some of Jun Sawada's notable coworkers include Toshiyuki Tarao and Toshikazu Takata. Their collaboration has likely enriched the research environment and fostered innovative ideas in their respective fields.
Conclusion
Jun Sawada's work in the development of rotaxanes and polyurethanes exemplifies his innovative spirit and dedication to advancing materials science. His contributions continue to influence the industry and inspire future research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile