This inventor holds 1 USPTO granted patent. Top assignee: Hunan Ovay Technology Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Jun Peng - Innovator in High Temperature-Resistant Membrane Technology
Introduction
Jun Peng is a notable inventor based in Zhuzhou, China. He has made significant contributions to the field of nanofiltration technology. His innovative work focuses on developing high temperature-resistant composite membranes that have practical applications in various industries.
Latest Patents
Jun Peng holds a patent for a high temperature-resistant composite nanofiltration membrane and its preparation method. This advanced membrane consists of a base membrane and a polyamide membrane layered on top. The polyamide membrane is created using a combination of raw materials, including an amine, an inorganic salt, a silane additive, a polyacyl chloride, and an oil phase solvent. The silane additive is selected from a group that includes 3-aminopropyltriethoxysilane, divinyltriaminopropyltrimethoxysilane, N-cyclohexyl-γ-aminopropyltrimethoxysilane, and trimethoxy[3-(phenylamino)propyl]silane. This innovation is particularly valuable for applications requiring durability under high temperatures.
Career Highlights
Jun Peng is currently employed at Hunan Ovay Technology Co., Ltd. His role at the company allows him to further explore and develop his innovative ideas in membrane technology. With a focus on practical applications, he has been able to bridge the gap between research and real-world solutions.
Collaborations
Jun has collaborated with talented coworkers, including Hui Yu and Hongwei Lu. Their combined expertise has contributed to the advancement of their projects and the successful development of new technologies.
Conclusion
Jun Peng's work in high temperature-resistant composite nanofiltration membranes showcases his innovative spirit and dedication to advancing technology. His contributions are paving the way for new applications in various industries, highlighting the importance of research and development in creating practical solutions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile