Tokyo, Japan

Jun Onodera

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nec Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Onodera. Retrieved from https://idiyas.com/inventor/jun-onodera-zmstuvk4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jun Onodera: Innovator in Scoring Technology

Introduction

Jun Onodera is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of scoring technology, particularly through his innovative patent. His work is recognized for its potential applications in various scoring systems.

Latest Patents

Jun Onodera holds a patent for a scoring device, scoring method, and recording medium. This scoring device includes a classifying unit that classifies answer data into multiple subsets. Additionally, it features an adding unit that incorporates a scoring criterion based on the classification results. This invention showcases Onodera's ability to enhance scoring methodologies.

Career Highlights

Onodera is currently employed at NEC Corporation, a leading technology company known for its advancements in information technology and communications. His role at NEC allows him to further develop his innovative ideas and contribute to the company's success.

Collaborations

Throughout his career, Jun Onodera has collaborated with talented individuals such as Toshiyuki Kataoka and Shun Maruyama. These collaborations have likely enriched his work and fostered a creative environment for innovation.

Conclusion

Jun Onodera is a distinguished inventor whose work in scoring technology has the potential to impact various fields. His patent reflects his innovative spirit and dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…