Nagoya, Japan

Jun Nakashima

This inventor holds 1 USPTO granted patent. Top assignee: Mitsui Chemicals, Inc.. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Nakashima. Retrieved from https://idiyas.com/inventor/jun-nakashima-5f4kn01e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Jun Nakashima: Innovator in Semiconductor Protection

Introduction

Jun Nakashima is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work focuses on developing materials that enhance the protection of semiconductor wafers.

Latest Patents

Nakashima holds a patent for a pressure-sensitive adhesive film designed for the surface protection of semiconductor wafers. The patent details a surface protecting adhesive film where an adhesive layer is formed on one surface of a base film. This adhesive layer comprises specific polymers and a cross-linking agent, ensuring excellent adhesion, prevention of breakage, and contamination resistance. The film's thickness ranges from 5 µm to 50 µm, making it suitable for various applications in semiconductor manufacturing.

Career Highlights

Jun Nakashima is currently employed at Mitsui Chemicals, Inc., where he continues to innovate in the field of materials science. His work has been instrumental in advancing technologies that protect sensitive semiconductor components.

Collaborations

Nakashima collaborates with talented individuals such as Masafumi Miyakawa and Makoto Kataoka, contributing to a dynamic research environment that fosters innovation.

Conclusion

Jun Nakashima's contributions to semiconductor protection through his patented adhesive film exemplify the importance of innovation in technology. His work not only enhances the durability of semiconductor wafers but also showcases the potential for advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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