This inventor holds 1 USPTO granted patent. Top assignee: Toyo Gosei Co., Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Jun Iwabuchi: Inventor of a Photo-Acid-Generating Sulfonium Salt
Introduction
Jun Iwabuchi is an inventor associated with Chiba, Japan, and Toyo Gosei Co., Ltd. His patent work includes a sulfonium salt designed for use as a photo-acid generator in photoresist materials. The available information identifies 1 patent associated with him.
Latest Patents
Iwabuchi’s listed invention, “Sulfonium salts,” addresses compatibility between photo-acid generators and photoresist polymers containing acid-dissociable groups. The invention describes a sulfonium salt intended to avoid poor compatibility with these polymers. Its structure includes specified hydrocarbon and organic groups, which may be linked to form a divalent organic group, along with an anion.
Career Highlights
Iwabuchi’s identified patent reflects work on materials for photoresist applications. The disclosed sulfonium salt is designed to generate acid upon exposure and to work compatibly with polymers used in photoresist formulations. He is associated with Toyo Gosei Co., Ltd.
Collaborations
Yosuke Osawa is identified as Iwabuchi’s coworker. The available information does not specify whether Osawa collaborated on the sulfonium salt patent.
Conclusion
Jun Iwabuchi’s listed patent focuses on a photo-acid-generating sulfonium salt intended to improve compatibility with photoresist polymers, highlighting his contribution to materials innovation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile