Isehara, Japan

Jun Ishikawa

This inventor holds 1 USPTO granted patent and 6 published patent applications. Top assignee: Semiconductor Energy Laboratory Co., Ltd.. Active years: 2026.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jun Ishikawa: Innovator in Semiconductor Technology

Introduction

Jun Ishikawa is a prominent inventor based in Isehara, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the characteristics of semiconductor devices, which are essential components in modern electronics.

Latest Patents

Ishikawa holds a patent for a semiconductor device and method for manufacturing a semiconductor device. This invention aims to provide a semiconductor device with less variation in transistor characteristics. The design includes a semiconductor film, a pair of blocking films over the semiconductor film, and an insulating film positioned between the blocking films. The semiconductor film features a pair of n-type regions and an i-type region located between them. The n-type regions overlap with the blocking films, while the i-type region overlaps with the insulating film. This innovative design enhances the performance and reliability of semiconductor devices.

Career Highlights

Jun Ishikawa is associated with Semiconductor Energy Laboratory Co., Ltd., where he continues to advance semiconductor technology. His expertise and innovative approach have positioned him as a key figure in the industry.

Collaborations

Ishikawa collaborates with Hiromi Sawai, contributing to the development of cutting-edge semiconductor solutions. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

Jun Ishikawa's contributions to semiconductor technology highlight his role as an influential inventor. His patent for a semiconductor device demonstrates his commitment to enhancing electronic performance. Through his work, he continues to shape the future of technology.

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