Osaka, Japan

Jun-ichi Nakamura

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Nippon Shokubai, Nippon Shokubai Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun-ichi Nakamura. Retrieved from https://idiyas.com/inventor/jun-ichi-nakamura-s5g82edu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Jun-ichi Nakamura: Innovator in Polymeric Materials

Introduction

Jun-ichi Nakamura is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of polymeric materials, particularly through his innovative patent that addresses key challenges in material science.

Latest Patents

Nakamura holds a patent for a polymeric material, production method therefor, and polymeric material composition. This invention aims to provide a polymeric material that exhibits reduced coloration in the visible light region, a high refractive index, and low optical dispersion. The polymeric material features a sulfoxide structure in its main chain, which enhances its optical properties.

Career Highlights

Nakamura is associated with Nippon Shokubai Co., Ltd., a company known for its advancements in chemical products and materials. His work has contributed to the development of innovative solutions in the polymer industry.

Collaborations

Nakamura has collaborated with notable colleagues, including Kenichi Oyaizu and Motoyasu Hirai, to further enhance the research and development of polymeric materials.

Conclusion

Jun-ichi Nakamura's contributions to polymeric materials demonstrate his commitment to innovation and excellence in material science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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