Yongin, South Korea

Jun Hyeuk Ko

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Hyeuk Ko. Retrieved from https://idiyas.com/inventor/jun-hyeuk-ko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Jun Hyeuk Ko

Introduction

Jun Hyeuk Ko is an accomplished inventor based in Yongin, South Korea. He is known for his contributions to the field of deposition technology, particularly in the development of advanced apparatuses for material deposition.

Latest Patents

One of his notable patents is a deposition apparatus designed for depositing a deposition material on a base substrate. This apparatus features a mask assembly that includes a mask frame defining an opening and a mask disposed on the frame. Additionally, it incorporates an electrostatic chuck positioned on the base substrate, along with a plate placed on the electrostatic chuck. The electrostatic chuck is equipped with multiple magnetic bodies, where at least one magnetic body possesses a different magnetic property compared to the others.

Career Highlights

Jun Hyeuk Ko is currently employed at Samsung Display Co., Ltd., where he continues to innovate and contribute to the advancement of display technologies. His work has significantly impacted the efficiency and effectiveness of deposition processes in the industry.

Collaborations

He collaborates with fellow inventor Jae Suk Moon, enhancing the creative synergy within their projects.

Conclusion

Jun Hyeuk Ko's innovative work in deposition technology exemplifies the spirit of invention and collaboration in the field. His contributions continue to shape advancements in display technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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