Pyeongtaek, South Korea

Jun Hyeong Lee

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Wonik Ips Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Hyeong Lee. Retrieved from https://idiyas.com/inventor/jun-hyeong-lee-ayo8u2oz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Jun Hyeong Lee

Introduction

Jun Hyeong Lee is a notable inventor based in Pyeongtaek, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique substrate processing apparatus.

Latest Patents

Jun Hyeong Lee holds a patent for a substrate processing apparatus. This apparatus includes a process chamber designed to process multiple substrates simultaneously. It features a gas injector that introduces processing gas into the chamber, a series of substrate supports for seating the substrates, and a conveyor system to transport the substrates between different supports. Additionally, the apparatus incorporates a substrate rotating part that allows for the rotation of the substrates, enhancing processing efficiency. This invention is a testament to his expertise and creativity in the field.

Career Highlights

Jun Hyeong Lee is currently employed at Wonik Ips Co., Ltd., where he continues to innovate and develop advanced technologies. His work has positioned him as a key figure in the substrate processing industry.

Collaborations

He collaborates with talented individuals such as Da Been Kim and Cheol Woo Lee, contributing to a dynamic and innovative work environment.

Conclusion

Jun Hyeong Lee's contributions to substrate processing technology exemplify his dedication to innovation. His patent reflects his ability to address complex challenges in the industry. His work continues to influence advancements in substrate processing, showcasing the importance of inventive minds in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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