Jun Hyeok Jeon

Title: Jun Hyeok Jeon: Innovator in Extreme Ultraviolet Lithography

Introduction

Jun Hyeok Jeon is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of extreme ultraviolet lithography, particularly through his innovative patent.

Latest Patents

Jun Hyeok Jeon holds a patent titled "Method for manufacturing pellicle for extreme ultraviolet lithography having graphene defect healing layer." This application relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. The method includes forming a support layer of a silicon nitride material on a silicon substrate and forming a core layer of a graphene material on the support layer. Additionally, the method involves forming a graphene defect healing layer on the core layer by selectively forming a material of MeON at a grain boundary of the core layer in an atomic layer deposition process using heat. This process aims to heal defects generated in graphene without causing additional damage. The method may also include a capping layer on the graphene defect healing layer, with a central portion of the silicon substrate under the support layer removed to form an opening that partially exposes the support layer.

Career Highlights

Jun Hyeok Jeon is associated with the Korea Electronics Technology Institute, where he continues to advance research and development in his field. His work has been instrumental in enhancing the manufacturing processes related to advanced lithography techniques.

Collaborations

He collaborates with esteemed colleagues, including Hyeong Keun Kim and Hyun Mi Kim, contributing to a dynamic research environment that fosters innovation.

Conclusion

Jun Hyeok Jeon's contributions to extreme ultraviolet lithography through his innovative patent demonstrate his commitment to advancing technology in this critical area. His work not only enhances manufacturing processes but also paves the way for future innovations in the field.