Jun Hwan Lee

Title: Jun Hwan Lee: Innovator in Substrate Treatment Technology

Introduction

Jun Hwan Lee is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Jun Hwan Lee holds a patent for a "Substrate treatment apparatus having exhaust structure." This invention includes a substrate support assembly with a spin head designed to seat a substrate. It features a fluid supply unit that delivers fluid to the substrate, a bowl assembly with multiple bowls arranged radially, and an ascending and descending unit for vertical movement. The apparatus is enclosed in a chamber that accommodates all components and is equipped with process exhaust parts for effective exhaust management.

Career Highlights

Jun Hwan Lee is associated with Deviceeng Co., Ltd., where he continues to innovate in substrate treatment technologies. His work has been instrumental in advancing the capabilities of substrate processing equipment.

Collaborations

He collaborates with talented coworkers, including Taek Youb Lee and Man Je Bang, who contribute to the innovative environment at Deviceeng Co., Ltd.

Conclusion

Jun Hwan Lee's contributions to substrate treatment technology exemplify the impact of innovation in enhancing industrial processes. His patent reflects a commitment to improving efficiency and effectiveness in substrate processing.