Iksan-si, South Korea

Jun-Gu Lee

This inventor holds 1 USPTO granted patent. Top assignee: Dongwoo Fine-Chem. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun-Gu Lee. Retrieved from https://idiyas.com/inventor/jun-gu-lee-cvlj2zhx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jun-Gu Lee: Inventor of a Metal Thin-Film Substrate for Transparent Displays.

Introduction

Jun-Gu Lee is an inventor based in Iksan-si, South Korea. His listed patent concerns a metal thin-film substrate and its use in transparent display technology.

Latest Patents

Lee is associated with 1 patent: “Metal Thin Film Substrate, Transparent Display Comprising Same, Method for Patterning Metal Thin Film Substrate, and Method for Manufacturing Transparent Display.” The disclosure describes a glass substrate with a pressure-sensitive adhesive layer on one surface and a metal layer formed on that adhesive layer. The adhesive layer contains a silicone-based pressure-sensitive adhesive. The patent also addresses a transparent display incorporating the substrate, a method for patterning the substrate, and a method for manufacturing the display.

Career Highlights

Lee is associated with Dongwoo Fine-Chem. His listed patent reflects work on materials and manufacturing methods intended for transparent display applications.

Collaborations

The provided information lists Sung-Jin Noh and Ki-Joon Park as Lee’s coworkers. It does not specify their roles in the patent or describe particular collaborations.

Conclusion

Jun-Gu Lee’s listed invention brings together a glass substrate, a silicone-based adhesive layer, and a metal layer for transparent display applications, alongside related patterning and manufacturing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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