Company Filing History:
Years Active: 2001
Title: Innovations by Jun Cheng in Semiconductor Cleaning Compositions
Introduction
Jun Cheng is an accomplished inventor based in Cupertino, CA (US). He has made significant contributions to the field of semiconductor cleaning technologies. With a total of 2 patents, his work focuses on developing effective compositions for cleaning organic and plasma etched residues from semiconductor devices.
Latest Patents
One of Jun Cheng's latest patents is titled "Compositions for cleaning organic and plasma etched residues for semiconductor devices." This innovative composition includes a mixture of fluoride compounds, water, organic amide solvents, and optional corrosion inhibitors, chelating agents, surfactants, acids, and bases. The composition is designed to have a pH between about 7 and about 10, allowing for effective cleaning of substrates when contacted for a specific time and temperature.
Another notable patent is "Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices." This composition features a blend of fluoride compounds, water, lactam solvents, and optional organic sulfoxide or glycol solvents. It maintains a pH between about 6 and about 10, ensuring optimal cleaning performance for semiconductor substrates.
Career Highlights
Jun Cheng is currently employed at EKC Technology Inc., where he continues to innovate in the field of semiconductor cleaning solutions. His expertise and dedication to research have positioned him as a key player in the industry.
Collaborations
Throughout his career, Jun Cheng has collaborated with notable colleagues, including Robert J. Small and Bakul P. Patel. These partnerships have contributed to the advancement of cleaning technologies in semiconductor manufacturing.
Conclusion
Jun Cheng's contributions to semiconductor cleaning compositions demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the challenges faced in semiconductor manufacturing and provide effective solutions for cleaning residues.
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