Jun Abe

Title: Innovations of Jun Abe in Semiconductor Manufacturing

Introduction

Jun Abe is a notable inventor based in Tachikawa, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on improving the processes involved in creating semiconductor integrated circuit devices.

Latest Patents

Jun Abe's latest patents revolve around a process for manufacturing semiconductor integrated circuit devices. The innovation aims to prevent reaction products of low vapor pressure from being deposited on the side walls of predetermined patterns during the dry-etching of Pt or PZT films. To achieve this, a resist mask with a rounded outer periphery is utilized. This mask is crucial when dry-etching the Pt film deposited on a semiconductor substrate. Following the dry-etching process, an appropriate extent of overetching is performed to completely eliminate any side wall deposited film left on the pattern. The resist mask is created by exposing and developing a benzophenone novolak resist, which is then heated to set while being irradiated with ultraviolet rays if necessary.

Career Highlights

Jun Abe is currently employed at Hitachi, Ltd., where he continues to innovate in the semiconductor field. His expertise and dedication have led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Jun Abe has collaborated with notable colleagues, including Takashi Yunogami and Shunji Sasabe. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Jun Abe's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and manufacturing processes.