This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Jumpei Hama: Innovator in Photocatalyst Technology
Introduction
Jumpei Hama is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photocatalysis, particularly with his innovative designs and applications. His work focuses on enhancing the efficiency of photocatalytic processes, which are crucial for various environmental and industrial applications.
Latest Patents
Jumpei Hama holds a patent for a photocatalyst filter designed for a light leakage type. This invention involves light-leakage type photocatalyst fibers that are bundled together to form a filter assembly. The assembly features an enormous number of minute gaps that provide fluid communication paths in the longitudinal direction of the photocatalyst fibers. Light is incident on each of the fibers while an object fluid to be processed is introduced through an end face of the filter assembly, allowing it to pass through the gaps among the fibers.
Career Highlights
Throughout his career, Jumpei Hama has demonstrated a commitment to advancing photocatalytic technology. His innovative approach has led to the development of practical solutions that address environmental challenges. His patent reflects his expertise and dedication to improving the efficiency of photocatalytic processes.
Collaborations
Jumpei Hama has worked alongside talented colleagues, including Yoshikazu Nishii and Soji Arai. Their collaborative efforts have contributed to the advancement of photocatalytic technologies and have fostered a creative environment for innovation.
Conclusion
Jumpei Hama is a distinguished inventor whose work in photocatalyst technology has the potential to make a significant impact on environmental solutions. His innovative patent showcases his expertise and commitment to advancing this important field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile