Company Filing History:
Years Active: 2016
Title: Julia Cushen: Innovator in Directed Self-Assembly Technologies
Introduction
Julia Cushen is a prominent inventor based in Mountain View, CA (US). She has made significant contributions to the field of directed self-assembly (DSA) of block copolymers, holding 2 patents that showcase her innovative approaches.
Latest Patents
Her latest patents include a method for directed self-assembly (DSA) of block copolymers using guiding line sidewalls. This patent describes a guiding pattern for DSA that consists of an array of spaced guiding stripes on a substrate. The stripes have specific dimensions that allow for effective self-assembly of silicon-containing block copolymers without silicon wetting the oxidized sidewalls. The process involves oxygen reactive ion etching (RIE) to remove the BCP component without silicon, leaving a silicon oxide pattern that serves as an etch mask for the underlying substrate.
Another notable patent is a method for making guiding lines with oxidized sidewalls for use in DSA of block copolymers. This method combines electron beam lithography and DSA to create guiding lines with improved quality and lower roughness compared to those made with e-beam lithography alone. The process involves multiple layers and etching steps to achieve the desired guiding lines.
Career Highlights
Julia Cushen is currently employed at HGST Netherlands, B.V., where she continues to advance her research in polymer technologies. Her work has positioned her as a key figure in the development of innovative methods for material assembly.
Collaborations
She collaborates with talented coworkers, including Ricardo Ruiz and Lei Wan, who contribute to her research efforts and help drive innovation in the field.
Conclusion
Julia Cushen's work in directed self-assembly technologies exemplifies her commitment to advancing the field of polymer science. Her patents reflect her innovative spirit and dedication to improving material assembly techniques.