Helsinki, Finland

Jukka Seppälä

This inventor holds 4 USPTO granted patents. Top assignees: Jvs-Polymers Oy, Leiras Oy, Neste Oy. Active years: 2001-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jukka Seppälä. Retrieved from https://idiyas.com/inventor/jukka-seppandaumllandauml

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 79(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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4 patents (USPTO):Explore Patents

Title: Jukka Seppälä: Innovator in Polymer Technology

Introduction

Jukka Seppälä is a prominent inventor based in Helsinki, Finland. He has made significant contributions to the field of polymer technology, holding a total of 4 patents. His work focuses on innovative materials that have practical applications in various industries.

Latest Patents

Among his latest patents are "Plastic based composite and its use" and "Block copolymers and preparation thereof." These inventions showcase his expertise in developing advanced materials that can enhance product performance and sustainability.

Career Highlights

Throughout his career, Jukka has worked with notable companies such as JVS-Polymers Oy and Neste Oy. His experience in these organizations has allowed him to apply his innovative ideas in real-world applications, contributing to the advancement of polymer science.

Collaborations

Jukka has collaborated with talented individuals in his field, including Petri Orava and Markku Heino. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jukka Seppälä's contributions to polymer technology and his innovative patents highlight his role as a key figure in the industry. His work continues to influence the development of new materials that can meet the demands of modern applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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