Jui-Cheng Wang

Title: Innovations of Jui-Cheng Wang

Introduction

Jui-Cheng Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods that enhance the performance of power devices. With a total of 3 patents to his name, Wang's work is recognized for its innovative approaches to reducing resistance in semiconductor devices.

Latest Patents

One of Wang's latest patents is titled "Method for reducing parasitic junction field effect transistor resistance." This invention provides a method applicable to high power devices with a semiconductor substrate layer. The process involves placing a plurality of hard masks on the top surface of the substrate, which allows for the formation of a body region with controlled dimensions. This design effectively reduces the resistance of the parasitic JFET region, while also increasing the breakdown voltage of the device.

Another significant patent is the "Process method for fabricating a three-dimensional source contact structure." This method is designed to create a step-like three-dimensional source contact structure in a MOSFET of a power device. By utilizing a combination of lithography and shallow trench processes, the invention enhances both horizontal and vertical contact surfaces when depositing source contact metal. This innovation is expected to reduce cell pitch effectively and can be applied to various power devices with MOSFET structures.

Career Highlights

Jui-Cheng Wang is affiliated with National Yang Ming Chiao Tung University, where he continues to advance research in semiconductor technologies. His work has garnered attention for its practical applications in improving device performance and efficiency.

Collaborations

Wang collaborates with esteemed colleagues, including Bing-Yue Tsui and Li-Tien Hsueh, who contribute to his research endeavors. Their combined expertise fosters an environment of innovation and discovery in the field of semiconductor technology.

Conclusion

Jui-Cheng Wang's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing the field. His work not only addresses current challenges but also paves the way for future developments in power devices.