JuHyuk Park

Title: JuHyuk Park: Innovator in Substrate Processing Technologies

Introduction

JuHyuk Park is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 3 patents. His innovative approaches have advanced the technology used in various applications.

Latest Patents

One of his latest patents is a substrate processing method that focuses on filling a recess without voids or seams. This method involves partially filling a trench with a first material on a substrate and supplying at least one constituent element included in the first material while applying plasma to induce fluidization. Another important patent is for a substrate processing device that includes a substrate supporting unit designed to prevent deformation during processing. This device features a contact surface that interacts with the edge of the substrate, incorporating a protruding structure to support deformation from within the edge.

Career Highlights

JuHyuk Park is currently employed at Asm IP Holding B.V., where he continues to develop innovative solutions in substrate processing. His work has been instrumental in enhancing the efficiency and effectiveness of substrate technologies.

Collaborations

Throughout his career, JuHyuk has collaborated with talented individuals such as SeungHwan Lee and HakYong Kwon. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

JuHyuk Park's contributions to substrate processing technologies highlight his role as a leading inventor in this field. His patents reflect a commitment to innovation and excellence, making a significant impact on the industry.