Juanjuan Li

Title: Innovations of Juanjuan Li in Radiofrequency Source Control

Introduction

Juanjuan Li is a prominent inventor based in Beijing, China. She has made significant contributions to the field of microelectronics, particularly in the control of radiofrequency sources. Her innovative approach aims to enhance the uniformity of plasma processes, which is crucial in various manufacturing applications.

Latest Patents

Juanjuan Li holds a patent for a "Control method of radiofrequency source." This patent describes a method that involves a radio frequency (RF) source comprising at least one pair of a main power supply and a secondary power supply operating at the same frequency. The method includes dividing each process step of a plasma process into multiple time periods. During each process step, it maintains a common exciter (CEX) phase locking delay angle of the power supplies at a predetermined value. This technique aims to improve the angular distribution uniformity of plasma, thereby enhancing the overall process uniformity of the workpiece being processed.

Career Highlights

Juanjuan Li is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. Her work at this company has allowed her to apply her innovative ideas in a practical setting, contributing to advancements in microelectronics and plasma processing technologies.

Collaborations

Throughout her career, Juanjuan Li has collaborated with notable colleagues, including Yahui Huang and Gang Wei. These collaborations have fostered a productive environment for innovation and development in their respective fields.

Conclusion

Juanjuan Li's contributions to the field of radiofrequency source control exemplify her commitment to innovation in microelectronics. Her patent and work at Beijing Naura Microelectronics Equipment Co., Ltd. highlight her role as a key player in advancing technology in this area.