This inventor holds 2 USPTO granted patents and 1 published patent application and 3 EPO patents. Top assignees: China Petroleum & Chemical Corporation, Haier Smart Home Co., Ltd., Qingdao Haier Dishwasher Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Juan Liu - Innovator in High-Pressure Gas Systems and Dishwashing Technology
Introduction
Juan Liu is an inventor based in Qingdao, China. He has made significant contributions to the fields of high-pressure gas systems and dishwashing technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.
Latest Patent Applications
Juan Liu's latest patent applications include:
1. **High-Pressure Gas Filling/Unloading System** - This system features a high-pressure gas pipeline connected to a gas filling station, a displacement gas pipeline for gas displacement, and multiple double-channel rotating joints that operate under pressure. The filling and unloading joint at the end of the pipeline includes a control mechanism that alternates between a displacement working channel and a filling and unloading working channel. This design allows for efficient gas filling and unloading processes.
2. **Control Method for Water Diversion Device, Water Diversion Device, and Dishwasher** - This application outlines a control method for a water diversion device that involves acquiring the target state position of a water diversion piece and controlling a driving component based on the current state position. The method ensures that the water diversion piece reaches the desired position effectively.
Conclusion
Juan Liu is an innovative inventor whose work in high-pressure gas systems and dishwashing technology showcases his potential in the field. His latest patent applications reflect his commitment to advancing technology, even as he seeks to secure granted patents in the future.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile