Juan F Choreno

Title: Innovations of Juan F. Choreno

Introduction

Juan F. Choreno is a notable inventor based in Zumpango, Mexico. He has made significant contributions to the field of technology, particularly in methods for detecting concealed patterns. With a total of 4 patents to his name, Choreno's work showcases his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is a method for detecting a concealed pattern. This method involves detecting infrared electromagnetic radiation that is either reflected or emitted by a component containing a first pattern. The component includes a substrate, with the first pattern disposed over at least a portion of the substrate. An optional primer layer may be placed between the substrate and the first pattern. Additionally, a first visibly opaque layer, which includes an infrared transparent pigment, is positioned over the first pattern. The method compares the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength to that of the primer layer and/or the substrate at the same wavelength.

Career Highlights

Juan F. Choreno is currently employed at PPG Industries Ohio, Inc. His role at the company allows him to apply his inventive skills and contribute to advancements in technology. His work has garnered attention for its innovative approach to pattern detection.

Collaborations

Choreno has collaborated with several talented individuals in his field, including Nicolas Benjamin Duarte and Zachary J. Brown. These collaborations have likely enriched his work and contributed to the development of his patents.

Conclusion

Juan F. Choreno is a distinguished inventor whose work in detecting concealed patterns has made a significant impact in technology. His innovative methods and collaborations highlight his dedication to advancing the field.