Siheung, South Korea

Ju Kwang Park

This inventor holds 1 USPTO granted patent. Top assignee: Cheil Industries Inc.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ju Kwang Park. Retrieved from https://idiyas.com/inventor/ju-kwang-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Ju Kwang Park: Innovator in Resin Composition Technology

Introduction

Ju Kwang Park is a notable inventor based in Siheung, South Korea. He has made significant contributions to the field of resin compositions, particularly in the development of materials that enhance the performance of color filters.

Latest Patents

Ju Kwang Park holds a patent for a resin composition comprising cardo resin, which includes a method for forming patterns using this composition. The patent details a resin composition that features a cardo resin, a reactive unsaturated compound, an initiator, and a solvent. This innovative composition allows for the creation of color filters that exhibit superior resistance to heat and chemicals, improved developability, and good adhesiveness.

Career Highlights

Ju Kwang Park is associated with Cheil Industries Inc., where he has been instrumental in advancing resin technology. His work has led to the development of materials that are crucial for various applications in the electronics industry.

Collaborations

Some of his notable coworkers include Hye Kyoung Cho and Cheon Seok Lee, who have collaborated with him on various projects related to resin compositions and their applications.

Conclusion

Ju Kwang Park's innovative work in resin composition technology has paved the way for advancements in color filter applications, showcasing his expertise and commitment to enhancing material performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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