Suwon-si, South Korea

Ju-Hyuk Chang


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Ju-Hyuk Chang: Innovator in Metal-Insulator-Metal Capacitor Technology

Introduction

Ju-Hyuk Chang is a prominent inventor based in Suwon-si, South Korea. He is known for his contributions to the field of semiconductor technology, particularly in the manufacturing of capacitors. His innovative approach has led to advancements that enhance the efficiency and reliability of electronic components.

Latest Patents

Ju-Hyuk Chang holds a patent for a "Method for manufacturing a metal-insulator-metal capacitor." This method involves forming a metal wire, including copper, on a substrate to create a MIM capacitor. The process includes the formation of a dielectric film on the metal wire, followed by the creation of a top electrode film. The top electrode film is then etched to form the final electrode, while a hard metallic polymer formed during etching is removed using a mixture of oxygen gas and fluorocarbon-based gas. This innovative method effectively prevents the lifting of thin films, increases the yield of the manufacturing process, and ensures uniform capacitance by preventing damage to the dielectric film and oxidation of the bottom electrode. Ju-Hyuk Chang has 1 patent to his name.

Career Highlights

Ju-Hyuk Chang is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has positioned him at the forefront of semiconductor innovation, contributing to the development of advanced electronic components that are essential in modern technology.

Collaborations

Throughout his career, Ju-Hyuk Chang has collaborated with notable colleagues, including Seung-Gun Lee and Il-Goo Kim. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Ju-Hyuk Chang's contributions to the field of semiconductor technology, particularly in the manufacturing of metal-insulator-metal capacitors, highlight his innovative spirit and dedication to advancing electronic components. His work continues to influence the industry and pave the way for future innovations.

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