Suwon-si, South Korea

Ju Hee Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ju Hee Lee. Retrieved from https://idiyas.com/inventor/ju-hee-lee-i5ssyplf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ju Hee Lee: Innovator in Image Sensor Technology

Introduction

Ju Hee Lee is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of image sensor technology. His innovative work has led to the development of a patented image sensor that enhances the capabilities of electronic devices.

Latest Patents

Ju Hee Lee holds a patent for an image sensor and method for fabricating the same. This invention includes a substrate with a photoelectric conversion region, a substrate trench, and a floating diffusion region. The design features a gate dielectric film and a transfer gate electrode, which improves the performance of image sensors in various applications.

Career Highlights

Ju Hee Lee is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of advancements in image sensor technology. With 1 patent to his name, he continues to push the boundaries of innovation in this field.

Collaborations

Throughout his career, Ju Hee Lee has collaborated with talented individuals such as Dong Mo Im and Ji Hee Yang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Ju Hee Lee is a notable inventor whose work in image sensor technology has made a significant impact. His contributions at Samsung Electronics Ltd. and his innovative patent demonstrate his commitment to advancing technology. His achievements highlight the importance of innovation in the ever-evolving tech landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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