Ju-eun Kim

Title: Ju-eun Kim: Innovator in Image Sensor Technology

Introduction

Ju-eun Kim is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of image sensor technology, holding 2 patents that showcase his innovative approach to semiconductor design.

Latest Patents

One of his latest patents involves an advanced image sensor that includes a semiconductor substrate with a trench extending from the surface into the substrate. This design features an insulating pattern within the trench and a doped region that optimizes the sensor's performance. The doped region is carefully engineered, with specific thickness ratios and dopant concentrations to enhance functionality. Another patent describes an image sensor with a substrate that has unit pixel regions equipped with photoelectric conversion regions. This design incorporates a semiconductor pattern in a defined trench, ensuring efficient light capture and conversion.

Career Highlights

Ju-eun Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of image sensor technology. His work has been instrumental in advancing the capabilities of imaging devices, making them more efficient and effective for various applications.

Collaborations

Throughout his career, Ju-eun has collaborated with talented individuals such as Kook Tae Kim and Miseon Park. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Ju-eun Kim's contributions to image sensor technology reflect his dedication to innovation and excellence. His patents not only enhance the capabilities of imaging devices but also pave the way for future advancements in the field.