Yongin, South Korea

Ju-Eel Mun

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Sdi Co., Inc.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ju-Eel Mun. Retrieved from https://idiyas.com/inventor/ju-eel-mun-wg9tg87b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 15.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Ju-Eel Mun: Innovator in Display Technology

Introduction

Ju-Eel Mun is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Ju-Eel Mun holds a patent for a display device with a reflective surface designed to enhance the viewing experience. This display device includes a display panel with a surface that displays images, a light source that emits light to the display panel, and a reflective surface that directs the emitted light to the edges of the display area. This invention aims to improve the visibility and quality of images displayed.

Career Highlights

Ju-Eel Mun is currently employed at Samsung SDI Co., Inc., where he continues to work on advancements in display technology. His expertise and innovative mindset have contributed to the company's reputation as a leader in the electronics industry.

Collaborations

Throughout his career, Ju-Eel Mun has collaborated with talented individuals such as Kyu-Won Jung and Hun-Soo Kim. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Ju-Eel Mun's contributions to display technology through his innovative patent exemplify his commitment to enhancing visual experiences. His work at Samsung SDI Co., Inc. and collaborations with fellow inventors highlight his role in advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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