Taipei, Taiwan

Ju-Chu Hsieh

This inventor holds 1 USPTO granted patent. Top assignee: Advanced-Connectek Inc.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ju-Chu Hsieh. Retrieved from https://idiyas.com/inventor/ju-chu-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Ju-Chu Hsieh: Innovator in Connector Technology

Introduction

Ju-Chu Hsieh is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of connector technology, particularly through his innovative designs that enhance charging efficiency. His work is recognized for its practical applications in modern electronic devices.

Latest Patents

Ju-Chu Hsieh holds a patent for a "Connector assembly having power contacts which comprise a plurality of contact inserting portions." This invention features a connector assembly that includes a plug and socket. The plug is designed with an insulative body, which contains at least one first power contact, at least one second power contact, and a metal shield. The design allows for increased charging speed, thereby reducing charging time for devices.

Career Highlights

Hsieh is currently employed at Advanced-Connectek Inc., where he continues to develop innovative solutions in connector technology. His work has been instrumental in advancing the efficiency of power connections in various electronic applications.

Collaborations

Throughout his career, Ju-Chu Hsieh has collaborated with talented individuals such as Fu-Yi Xu and Wei Wan. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Ju-Chu Hsieh's contributions to connector technology exemplify the impact of innovative thinking in the electronics industry. His patent reflects a commitment to improving device performance and user experience.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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