This inventor holds 7 USPTO granted patents. Top assignees: Refranco Corp., Plasma Holdings N.v., Other. Active years: 1987-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1987-1998
Title: Jozef K Tylko: Innovator in Plasma Treatment Technologies
Introduction
Jozef K Tylko is a notable inventor based in Minneapolis, MN (US). He has made significant contributions to the field of plasma treatment technologies, holding a total of 7 patents. His innovative approaches have paved the way for advancements in the treatment of particulate matter.
Latest Patents
Among his latest patents, Tylko has developed a reactor and method for the treatment of particulate matter by electrical discharge. This invention utilizes a series of electrode structures to define a reaction zone, where discrete electrical discharges are produced. The inter-electrode space is conditioned, allowing for effective plasma action. In a preferred embodiment, the reaction zone is subjected to a sequence of electrical discharges in a time interval shorter than the residence time of the material being treated. Another significant patent involves a method for treating comminuted matter by electrical discharge, which aims to produce a glassy product through similar plasma action techniques.
Career Highlights
Throughout his career, Tylko has worked with various companies, including Refranco Corporation. His work has focused on developing innovative solutions that leverage electrical discharge and plasma technology for material treatment.
Collaborations
Tylko has collaborated with notable individuals in his field, including Marek K Tylko and Marcel K Govaerts. These collaborations have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Jozef K Tylko's contributions to plasma treatment technologies highlight his innovative spirit and dedication to advancing material treatment methods. His patents reflect a commitment to harnessing electrical discharge for practical applications, making him a significant figure in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile