Seoul, South Korea

Jowoong Ha

This inventor holds 1 USPTO granted patent. Top assignee: Inostek Inc.. Active years: 2004.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Jowoong Ha: Innovator in Metallic Film Manufacturing

Introduction

Jowoong Ha is a prominent inventor based in Seoul, South Korea. He is known for his innovative contributions to the field of materials science, particularly in the manufacturing of metallic films. His work has significant implications for various applications in technology and engineering.

Latest Patents

Jowoong Ha holds a patent for a "Method of manufacturing metallic film consisting of giant single crystal grains." This method involves depositing a metallic film on a substrate in an inert gas atmosphere combined with a specific additive gas. This process alters the surface energy, grain boundary energy, or internal strain energy of the metallic film. Additionally, the method includes an annealing step at a temperature conducive to grain growth, allowing for the production of metallic films with giant single crystal grains. Notably, the films produced have a thickness-to-average grain size ratio exceeding 50, independent of the substrate type and deposition method. He has 1 patent to his name.

Career Highlights

Jowoong Ha is currently employed at Inostek Inc., where he continues to advance his research and development efforts. His work at the company focuses on innovative manufacturing techniques that enhance the quality and performance of metallic films.

Collaborations

He collaborates with talented colleagues, including Dong Su Lee and Dong Yeon Park, who contribute to his research initiatives and projects.

Conclusion

Jowoong Ha's innovative methods in metallic film manufacturing demonstrate his significant impact on the field of materials science. His contributions are paving the way for advancements in technology and engineering applications.

Profile summary based on public USPTO records.
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