Company Filing History:
Years Active: 2001-2002
Title: Innovations of Jovan M Nedelijkovic: Pioneering Semiconductor Technologies
Introduction
Jovan M Nedelijkovic, an accomplished inventor based in Belgrade, Yugoslavia, has made significant contributions to the field of nanotechnology. With two patents to his name, his work primarily focuses on semiconductor-assisted metal deposition techniques that have implications in nanolithography applications.
Latest Patents
Nedelijkovic's most recent patents detail a groundbreaking method involving a semiconductor oxide substrate that contains nanoparticles of semiconductor oxide. In this innovation, a modifier is deposited onto these nanoparticles, and a source of metal ions is introduced in conjunction with the semiconductor and the modifier. This innovative process enables electronic hole scavenging and chelation of the metal ions. The subsequent illumination of metal ions and the modifier leads to the reduction of these ions to metal on the semiconductor nanoparticles. These patents highlight not only the technical details of the manufacturing process but also open new doors for advancing nanotechnology applications.
Career Highlights
Throughout his career, Jovan has been associated with renowned institutions like Argonne National Laboratory and the University of Chicago. His tenure at these esteemed organizations provided him with a robust platform to develop and refine his innovative ideas in technology and research.
Collaborations
Nedelijkovic has had the opportunity to work alongside notable colleagues in the field, including Tijana Rajh and Natalia Meshkov. Their collaborative efforts in research have helped propel advancements in semiconductor technologies and nanolithography applications.
Conclusion
Jovan M Nedelijkovic's innovative spirit and dedication to advancing technology have positioned him as a key figure in the realm of semiconductor research. His patented methods reflect a commitment to enhancing our understanding and application of nanotechnology, ensuring that his contributions will resonate within the scientific community for years to come.