Shizuoka, Japan

Jotaro Hayasaka

This inventor holds 1 USPTO granted patent. Top assignee: Nihon Plast Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jotaro Hayasaka. Retrieved from https://idiyas.com/inventor/jotaro-hayasaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Jotaro Hayasaka: Innovator in Moderation Technology

Introduction

Jotaro Hayasaka is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of moderation technology through his innovative designs and patents. His work reflects a commitment to enhancing user experience through thoughtful engineering.

Latest Patents

Hayasaka holds a patent for a "Moderation Feeling Adding Apparatus." This invention features a base section that can operate in a predetermined direction, with a contact section attached to a spring. The apparatus generates a sound that creates a moderation feeling through the collision between the wall portion and the contact section, which is influenced by the biasing force of the spring. The design ensures that the clearance between the contact section and the wall portion is substantially equal on both sides, enhancing its functionality.

Career Highlights

Jotaro Hayasaka is currently associated with Nihon Plast Co., Ltd., where he continues to develop innovative solutions. His work at the company has allowed him to explore various applications of his inventions, contributing to advancements in moderation technology.

Conclusion

Jotaro Hayasaka's contributions to the field of moderation technology through his patent demonstrate his innovative spirit and dedication to improving user experiences. His work at Nihon Plast Co., Ltd. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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