Oakland, CA, United States of America

Joshua K Stolaroff

This inventor holds 1 USPTO granted patent. Top assignee: Lawrence Livermore National Security, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joshua K Stolaroff. Retrieved from https://idiyas.com/inventor/joshua-k-stolaroff

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Joshua K. Stolaroff

Introduction

Joshua K. Stolaroff is an accomplished inventor based in Oakland, CA. He has made significant contributions to the field of gas absorption and purification through his innovative work. His expertise lies in developing advanced materials that enhance the efficiency of gas capture technologies.

Latest Patents

Stolaroff holds a patent for "Composite 3D-printed reactors for gas absorption, purification, and reaction." This invention focuses on a composite material designed for gas capture, including CO2 capture and the absorption of other gases. The composite material consists of solid or liquid reactive material, filler material, and a gas-permeable polymer coating. This unique combination allows the reactive material to form micron-scale domains within the filler material, enhancing its effectiveness.

Career Highlights

Joshua K. Stolaroff is currently associated with Lawrence Livermore National Security, LLC. His work at this institution has allowed him to explore innovative solutions to pressing environmental challenges. His dedication to research and development has positioned him as a key figure in the advancement of gas capture technologies.

Collaborations

Due to space constraints, the details of his collaborations will not be included.

Conclusion

Joshua K. Stolaroff's contributions to the field of gas absorption and purification through his innovative patent demonstrate his commitment to addressing environmental issues. His work continues to inspire advancements in technology and sustainability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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