Joshua DeMuth

Title: Innovations of Joshua DeMuth in Electrochemical Liquid Phase Epitaxy

Introduction

Joshua DeMuth is an accomplished inventor based in Ann Arbor, MI (US). He has made significant contributions to the field of electrochemical liquid phase epitaxy (ec-LPE). His work focuses on developing processes and devices that enhance the formation of epitaxial crystalline films.

Latest Patents

Joshua DeMuth holds a patent for "Devices and methods for electrochemical liquid phase epitaxy." This patent describes processes and devices that can form precipitated epitaxial crystalline films or layers on a substrate. The precipitated films may comprise semiconductors such as germanium, silicon, or carbon. The invention involves dissolution into, saturation within, and precipitation of the semiconductor from a liquid metal electrode, such as a mercury pool, near an interface region with a substrate. This process yields a polycrystalline semiconductor material deposited as an epitaxial film. Additionally, the patent includes reactor cells for use in ec-LPE devices that feature porous membranes to facilitate the formation of these films.

Career Highlights

Joshua DeMuth is affiliated with the University of Michigan, where he continues to advance research in his field. His innovative work has garnered attention for its potential applications in semiconductor technology.

Collaborations

Joshua has collaborated with notable colleagues, including Stephen Maldonado and Eli Fahrenkrug, who contribute to the research environment at the University of Michigan.

Conclusion

Joshua DeMuth's contributions to electrochemical liquid phase epitaxy represent a significant advancement in semiconductor technology. His innovative patent and collaborative efforts highlight his role as a key inventor in this field.