Joshua Andrew Kaitz

Title: Joshua Andrew Kaitz and Gray-Tone Resist Technology.

Introduction

Joshua Andrew Kaitz is an inventor based in Woodinville, Washington, whose patent work addresses materials and processes for fabricating surface-relief gratings. His disclosed invention focuses on improving gray-tone photoresist performance during patterning and etching.

Latest Patents

Kaitz is associated with 1 patent, titled “Gray-tone resists and processes.” The patent describes techniques for producing straight or slanted surface-relief gratings with uniform or non-uniform depth. In certain embodiments, the gray-tone photoresist combines novolac resin, a diazonaphthoquinone (DNQ) dissolution inhibitor, and crosslinking agents. After exposure and development, baking at an elevated temperature crosslinks the resin, increasing the resist’s density and glass transition temperature and potentially lowering its etch rate. These properties help prevent the resist from becoming flowable during etching, reducing ripples and other surface roughness.

Career Highlights

Kaitz is associated with Meta Platforms Technologies, LLC. His patent reflects work on photoresist materials and fabrication processes that can support more controlled grating structures.

Collaborations

Keren Zhang and Xu Zhang are identified as Kaitz’s coworkers. The patent information provided describes related technical work but does not specify their individual contributions.

Conclusion

Joshua Andrew Kaitz’s patent on gray-tone resists and processes presents an approach to improving surface-relief grating fabrication by using crosslinked photoresist designed to maintain its shape during etching.