Company Filing History:
Years Active: 2010-2019
Title: The Innovative Contributions of Josephus Hubertus Maria Lange
Introduction
Josephus Hubertus Maria Lange, an inventive mind based in Almere, Netherlands, has made significant strides in the field of polymer chemistry. With four patents to his name, Lange's work has focused on developing novel compositions that harness the potential of ethylene polymers for various applications.
Latest Patents
Lange's latest patents involve compositions containing ethylene polymers. These compositions are particularly noteworthy as they include an ethylene polymer derived from at least one polar monomer with one or more ester groups, polymerizing with ethylene. Specifically, his innovations encompass copolymers formed from ethylene and vinyl acetate or ethylene and n-butyl acrylate, along with a rosin ester. The innovative aspect of his compositions lies in the potential to achieve a low hydroxyl number, low acid number, and low PAN number, enhancing their stability properties. This leads to improved viscosity stability, color stability, and a reduction in char particle formation during thermal aging, making them highly valuable in various industrial applications.
Career Highlights
Throughout his career, Lange has contributed to prominent companies in the chemical manufacturing sector, notably Kraton Chemical and Arizona Chemical Company. His role in these organizations reflects his expertise and commitment to advancing polymer technology.
Collaborations
Lange has worked alongside notable colleagues such as Mark Schaapman and Erik Kelderman. These collaborations have likely enriched his research and development efforts, fostering an environment of shared innovation and discovery in the field.
Conclusion
Josephus Hubertus Maria Lange's work in the field of ethylene polymer compositions represents a significant contribution to polymer science and engineering. His innovative compositions not only exhibit improved properties but also pave the way for new applications in various industries, showcasing the importance of continued research and collaboration in advancing technological solutions.
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