Geldrop, Netherlands

Josephus C M Hendricx

This inventor holds 1 USPTO granted patent and 5 EPO patents. Top assignee: Koninklijke Philips Corporation N.v.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Josephus C M Hendricx. Retrieved from https://idiyas.com/inventor/josephus-c-m-hendricx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Josephus C. M. Hendricx: Inventor of a High-Pressure Discharge Lamp

Introduction

Josephus C. M. Hendricx is an inventor associated with Geldrop, the Netherlands. His recorded patent work concerns the design and manufacture of a ceramic, gas-tight high-pressure discharge lamp burner. His portfolio includes 1 patent.

Latest Patents

Hendricx’s patent, “High-pressure discharge lamp, and method of manufacture thereof,” describes a ceramic gas-tight burner containing an ionizable filling. The discharge vessel has a cavity volume ranging from 3 mm³ to 30 mm³ and an internal filling pressure of 0.1 MPa to 4 MPa at room temperature. The patent also describes end-closure designs in three-part, two-part, or one-part configurations, each intended to reduce crevices.

Career Highlights

Hendricx’s listed company affiliations include Koninklijke Philips Corporation N.V. and Koninklijke Philips Electronics N.V. His patent reflects work on burner construction, filling conditions, and end-closure design for high-pressure discharge lamps.

Collaborations

His listed coworkers include Jan A. J. Stoffels and Jean-Sébastien Straetmans.

Conclusion

Josephus C. M. Hendricx’s recorded invention focuses on improving the construction and manufacture of high-pressure discharge lamp burners through carefully specified cavity, pressure, and end-closure designs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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