Portland, OR, United States of America

Joseph Wei

This inventor holds 3 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Lam Research Corporation. Active years: 2018-2026.

USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018-2026

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3 patents (USPTO):Explore Patents

Title: Innovations of Joseph Wei

Introduction

Joseph Wei is an accomplished inventor based in Portland, OR. He has made significant contributions to the field of chemical vapor deposition processes, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing systems.

Latest Patents

One of his latest patents is a low temperature plasma enhanced chemical vapor deposition process that includes preheating a showerhead prior to the deposition process. This method involves determining the temperature of the showerhead during preheating and ceasing the preheating once a specific temperature criterion is met. This innovation aims to improve the packaging of integrated circuits on substrates.

Another notable patent involves a tray designed for storing minimum contact area components and wafer transfer pins during system maintenance. This tray features compartments specifically designed to retain lift pins and MCA pins, ensuring organized storage and easy access during maintenance tasks.

Career Highlights

Joseph Wei is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop and patent innovative solutions that enhance substrate processing technologies.

Collaborations

Throughout his career, Joseph has collaborated with talented individuals such as Terrence George Bernier and Tony Nguyen. These collaborations have contributed to the advancement of technologies in the semiconductor field.

Conclusion

Joseph Wei's contributions to the field of chemical vapor deposition and substrate processing are noteworthy. His innovative patents and collaborative efforts continue to impact the semiconductor industry positively.

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